UV-ALD, which combines ultraviolet light with the deposition process, enables more dielectric film placement than traditional ALD. However, no one had explored the application of UV-ALD for 2D ...
ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
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